Dependence of Structural and Electrical Properties of Sputtered-Fe3O4 Thin Films on Gas Flow Rate

Magnetite (Fe3O4) is a potential material for spintronic development due to its high Curie temperature (858 K) and half-metallic structure with only one spin polarization at Fermi level. The bulk properties of Fe3O4 make it big challenge grow perfectly stoichiometric thin films low temperature. Here, we report the structural morphological evolution as function gas flow rate. Radio-frequency (RF) magnetron sputtering was used fabricate on MgO/Ta/SiO2 room Atomic force microscopy (AFM) shows spherical-like shape, root-mean-square (RMS) roughness varies from 1.5 nm 7.5 nm, grain size increases 30 74.3 nm. are dramatically enhanced by increasing Moreover, resistivity (r) versus (T) reveals existence Verwey transition below 120 K, indicating presence Fe3O4.